Fraunhofer Institute for Applied Optics and Precision Engineering IOF

Booth number 4545-27

About us

The Fraunhofer Institute for Applied Optics and Precision Engineering IOF develops innovative optical systems to control light from the generation to the application.

Our service range covers the entire photonic process chain from optomechanical and optoelectronic system design to the manufacturing of customized solutions and prototypes.

The institute works in the five business fields of Optical Components and Systems, Precision Engineering Components and Systems, Functional Optical Surfaces and Layers, Photonic Sensors and Measuring Systems and Lasers.

Products and services

  • Monolithic PGP disperser for compensation of aberrations in imaging spectrographs
  • Four-level binary effective-medium CGH for enhanced throughput in interferometric metrology setups
  • Linear grating on curved surface for Offner-type spectrometer in DESIS space mission 
  • Replication of a fully-populated wafer with customized Fresnel lenses 
  • Conformal antireflection coatings and bandpass filters by ALD
  • Broadband antireflection coatings AR-plas2® for glass and plastic optics
  • Nanostructured top-layers enable low residual reflectance on curved lenses
  • Additive manufacturing of optical high-power components
  • High-power and photonic crystal fiber preforms and fibers
  • Laser-machined preforms
  • CO2 laser-spliced fibers with different end-caps
  • LIDAR fiber laser
  • Quantum communication technology for satellites
  • Smart LTCC platform for laser optical systems
  • Printed wafer-based micro-lens arrays
  • Large aperture, low birefringence soldered lenses
  • Adaptive high-power mirror
Lithographic patterning of non-planar surfaces

The integration of multiple optical functionalities into a single (ideally monolithic) hybrid element allows the downsizing of complex high-performance optical systems. As an example, Offner type imaging spectrometers make use of a reflective grating structure at a spherical shaped surface. An ultra-precision machined surface has been patterned by direct-writing optical lithography and a subsequent etching transfer using a reactive plasma process. It became part of the DESIS space mission.

Atomic Layer Deposition of Antireflection Coatings and Bandpass Filters

Conformal coatings are enabled by atomic layer deposition (ALD). This deposition method is based on cyclic, self-limiting reactions of precursors at the substrate surface. It allows precise thickness and composition control of thin films on arbitrarily shaped optics, which is a prerequisite for high optical performance. Interference multilayer optical coatings such as antireflection coatings and narrow bandpass filters on strongly curved optical lenses and dome components are presented.

Direct bonding of diffraction gratings and prisms

The demands on spectroscopic systems are immense. Experts at Fraunhofer IOF have developed a technology that even thick and rigid components, such as prisms, can be connected, so spectrometers can be built even more compact and robust in the future. The method is based on the formation of covalent oxygen bonds between different glass surfaces. This makes the PGP (prism-grating-prism) system suitable for other vacuum applications, for example precision optics or highly sensitive interferometers

Fraunhofer Institute for Applied Optics and Precision Engineering IOF
Albert-Einstein-Str. 7
07745 Jena

Phone: +49 3641 807-0
Fax: +49 3641 807-600
E-mail: Send message

Contact person

Dr. Kevin Füchsel
Head of Strategy / Marketing / Communication
Phone: +49 3641 807273 / +49 171 1875165
E-mail: Send message

News & Innovations

Grayscale lithographic mastering of tailored micro-optical elements

Optical systems benefit from customized components like freeforms introducing additional design freedoms to the cost of complex surface shapes that are often hard to engineer. Optical grayscale lithography is a versatile technology to manufacture arbitrary surface profiles to address DOEs like (blazed) gratings, correction plates, CGHs, beam-shapers and refractive elements like (Fresnel) microlenses, freeforms or achromatic diffusers. The patterns are scalable to arrays, wafer-level and beyond.

Further reading

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